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Dec 18, 2025, 7:15 am125 pts
Digitimes
Intel has completed acceptance testing of the industry's first commercial high-NA EUV lithography system with a numerical aperture of 0.55, the ASML Twinscan EXE:5200B, laying the foundation for mass production of its 14A process node. This milestone marks the transition of high-NA EUV technology from research…
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