TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use
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Sep 8, 2026, 11:00 am107 pts
Tom's Hardware
For years, TSMC has tried to avoid making public comments about its plans to use EUV lithography with a 0.55 numerical aperture optics, or High-NA EUV, because the company's developers had a good idea how to keep advancing process technologies without using $400 million scanners. However, TSMC cannot rely on…
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